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Alphabetical Listing of Reference Documents by Title
NOTE: [PDF] links require Acrobat Reader from Adobe.
450mm: What Will It Cost To Get There?
Abstract: Issues for the industry to convert from the current 300mm wafer to a future 450mm wafer, slated for 2012. Historically, changing from one wafer size to the next has been very expensive and results in inefficiencies and more resource requirements.
Source: Future Fab International (Vol 20)
Breakthrough Design Team - With a Little Help from RMI, Texas Instruments Breaks New Ground [PDF]
Abstract: Steps Texas Instruments has taken to design energy and water efficiency into a new semiconductor manufacturing facility in Richardson, Texas. By Page, C.
Source: Rocky Mountain Institute
Draft Strategy for National Clean Water Industrial Regulations
Abstract: EPA's Draft Strategy for National Clean Water Industrial Regulations. Includes info on regulations and effluents associated with semiconductor manufacturing.
Source: US Environmental Protection Agency
Efficient Water Use for Texas: Policies, Tools, and Management Strategies
Abstract: Disccusses why and how semiconductor fabrication plants are in an ideal position to enact sequential water reuse. Cites successes. (By Gerston, MacLeod, & Jones).
Source: Texas Agricultural Experiment Station at Texas A&M University.
LSI Logic - Green Permit Annual Report [PDF]
Abstract: Strategies used by LSI Logic to reduce chemical use and waste in semiconductor manufacturing.
Source: LSI Logic Corporation
Recycle Spent Rinse Waters with Electrodeionization (EDI) [PDF]
Abstract: Performance of a small separate-bed EDI cell fed by representative spent rinse waters. EDI is growing in importance as an alternative, primary ion-exchange process useful for recycling spent rinse waters. By Donovan & Morrison.
Source: Sandia National Laboratories
Reducing Water Consumption in Semiconductor Fabs
Abstract: Article based on a paper presented in 2002 showing numerous implementations at Fairchild Semiconductor to reduce ultrapure water or deionized water use. By Klusewitz & McVeigh.
Source: MicroMagazine.com / 13th annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference
Reducing Water Usage in Semiconductor Manufacturing
Abstract: Semiconductor manufacturers in many locations are being denied requests for additional water to support plans for expanding production. Discusses four approaches to reducing water use. (By Donovan, R)
The 1.7 Kilogram Microchip: Energy and Material Use in the Production of Semiconductor Devices [PDF]
Abstract: By Williams, E., et al. Describes the amount of inputs required to produce a single chip, which amounts to about 630 times the weight of the chip itself.
Source: Environmental Science and Technology
Ultrapure Water Production
Abstract: Description of ultrapure water generation processes. By DeGenova, J.
Source: Department of Chemical and Environmental Engineering, University of Arizona
Ultrapure Water: Rewards of Recycling
Abstract: Benefits of recycling water in semiconductor fabs. Semiconductor International, (February 1998): 71-76. (Not available online).
Water Usage Reduction in a Semiconductor Fabricator (Abstract Only)
Abstract: Actual (by Klusewitz & Veigh) article describes methodology and results to reduce the ultra pure water usage in the Fairchild Mountaintop 6" fab.
Source: Congrès ACMS 2002
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